Valeriy V. Felmetsger:
Technologist, innovator, author, patent holder


OEM Group’s Process Development Manager Dr. Valeriy V. Felmetsger has more than three decades of wide-ranging Physical Vapor Deposition (PVD) experience including process development, thin-film characterization and implementation of leading-edge PVD processes in mass production.

Felmetsger’s research and development projects within OEM Group’s growing Applications Lab, focus today on deposition of piezoelectric Aluminum Nitride (AlN) films for electro-acoustic semiconductor devices particularly, ultra-thin films required for 10 – 20 GHz devices, including superior control of film in-plane stress and stress gradient independent of other properties.

Dr. Felmetsger earned an M.S. degree in electrical engineering from Ryazan State Radio-Engineering University, (Ryazan, Russia, southeast of Moscow) and later a Ph.D. in material science from the Institute of High-Current Electronics (Tomsk, Russia, in Siberia).

As a part of his doctoral studies, Felmetsger developed a novel vacuum arc-plasma deposition scheme that leveraged electrical erosion-resistant transition metal coatings (molybdenum and tungsten).

He has extensive experience in magnetron reactive sputtering, chiefly in AC-reactive sputtering by a dual cathode S-Gun magnetron.

In collaboration with researchers and academics worldwide, Dr. Felmetsger has been developing advanced technological solutions for devices operating in harsh environments.

He is the author of more than 60 publications and holds 16 technology patents.