Endeavor EUV PVD

SFI Endeavor

Endeavor EUV PVD Introduction

Endeavor EUV Substrate Size: 6″ x 6″ Reticle

The Endeavor EUV cluster tool is a state-of-the-art platform for advanced PVD of buffer, absorber, and anti-reflective layer thin films for EUVL photomasks up to 150mm square. The keys to EUVL mask making are critical film quality control and ultra-clean, low defect deposition. Patented S-Gun reactive sputtering modules deliver superior results on a the production proven Endeavor cluster tool. SMIF compatible, the transport system is designed for edge-only reticle handling and the unique “sputter-up” configuration allows processing without any contact to the reticle ‘s front or back faces. No other platform offers this unique solution for ultra low particle performance.

Endeavor EUV

Other Endeavor Models

Endeavor FX PVD

Endeavor FX PVD

Endeavor AT PVD

Endeavor AT