Cintillio HF Vapor System

Cintillio CPT

Cintillio HF Vapor System Introduction

The Cintillio HF Vapor platform delivers the OEM Group patented HF Vapor process. The on-axis, HDPE, process chamber can accommodate up to 25 wafers in a vertical orientation.

Process Applications:

  • Spring Release
  • Selective oxide etch
  • Hydrophobic termination

Features:

  • HDPE process chamber
  • Atmospheric process
  • MFC control
  • Up to 25-wafer loads
  • No DIW used in the process

Benefits:

  • No “memory” effect
  • Simple facilities
  • Precise, flexible process control
  • High throughput
  • Stiction free process

Cintillio HF Vapor

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