The Novellus Concept One platforms consist of the Concept One-150, which processes 100mm and 150mm wafers, and the Concept One-200, which processes 150mm to 200mm wafers. the Concept One process chamber has a Carouseling Batch deposition design with 6 to 8 deposition positions. Each position runs deposition with a dedicated showerhead delivering gases and plasma to the wafer.