AMAT P5000 CVD and Etch

Applied Materials

Applied Materials P5000 Introduction

The P5000 is the most flexible, successful, single-wafer, multi-chamber CVD and etch system for manufacturing complex devices in high-volume production.  As the licensed manufacturer of the Applied Materials P5000, OEM Group provides new and remanufactured P5000 systems, technical support, and software licensing as well as upgrades including chamber additions, upgrade kits, and enhancements.

Benefits:

  • Production-proven solution
  • Industry lowest CoO
  • High Throughput

Applications:

  • Discretes
  • MEMS
  • Optoelectronics
  • Packaging
  • Advanced Packaging

Processes:

P5000 Etch

P5000 CVD

  • Silicon Oxide
  • Silicon Nitride
  • Oxynitride RIE
  • Silane Oxide
  • Silane Nitride
  • Oxynitride
  • TEOS Oxide

Features:

  • 1 – 4 Chambers:  Universal Lamp Heated CVD, MxP Etch, MxP+ Etch, eMxP, ASP Asher, Wafer Orienter
  • Large install base of volume production tools
  • Standard processes for silicon oxide and nitride
  • Available 75 to 200 mm wafer transport
  • Substrate Handling:  75mm – 200mm SiC, Sapphire, Quartz, Ge, GaAs, GaN, Silicon
  • OEM Group Inc. IP
  • Bipolar Ceramic ESC
  • Transparent Wafer
  • Orienter GEMS Interface for Factory Automation

Benefits:

  • Proven reliability
  • Better process control and repeatability = Higher Yield
  • Enhanced factory automation support
  • Reliable and production proven processes for dielectric etch & CVD
  • Excellent value proposition for 75mm, 100mm, 150mm & 200mm

AMAT P5000 CVD